Simultaneous Determination of Micro-amount of Elements in Industrial Silicon by Inductively Coupled Plasma-Optical Emission Spectrometry

A method for the determination of Al, Fe, Ca, Mg, K, Na, P, Ba, Be, Cd, Ce, Co, Cr, Cu, Li, Mn, Mo, Ni, Pb, Ti, V, W, Zn, As, Sr, La, Sb, B in industrial silicon samples by inductively coupled plasma-optical emission spectrometry was reported in this paper. The substraction method was used to calculate the content of matrix element silicon and the simultaneous determination of major elements and impurity elements was realized. The recoveries of the method for the 28 elements are 94.0%~103.4% with precision of less than 3.0% RSD（n=10）. The method has been verified by analyzing the National Standard Reference materials and the results are agreement with certified values.