电感耦合等离子体发射光谱法测定工业硅中微量元素

Simultaneous Determination of Micro-amount of Elements in Industrial Silicon by Inductively Coupled Plasma-Optical Emission Spectrometry

摘要: 采用电感耦合等离子体发射光谱法同时测定工业硅中可能存在的铝、铁、钙、镁、钾、钠、磷、钡、铍、镉、铈、钴、铬、铜、锂、锰、钼、镍、铅、钛、钒、钨、锌、砷、锶、铼、锑、硼28个微量元素，并以差减法计算基体硅的含量，实现了对试样基体及杂质元素含量的同时测定。方法对28个微量元素的回收率为94.0%～103.4%，精密度（RSD，n=10）低于3.0%。方法经国家实物标准物质验证，测定值与标准值基本相符。

Abstract: A method for the determination of Al, Fe, Ca, Mg, K, Na, P, Ba, Be, Cd, Ce, Co, Cr, Cu, Li, Mn, Mo, Ni, Pb, Ti, V, W, Zn, As, Sr, La, Sb, B in industrial silicon samples by inductively coupled plasma-optical emission spectrometry was reported in this paper. The substraction method was used to calculate the content of matrix element silicon and the simultaneous determination of major elements and impurity elements was realized. The recoveries of the method for the 28 elements are 94.0%~103.4% with precision of less than 3.0% RSD（n=10）. The method has been verified by analyzing the National Standard Reference materials and the results are agreement with certified values.